Research Facility
Device Fabrication
Cleanroom
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Mainly used for device fabrication of 2D materials. Air shower is equipped.
Lithography set-up
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Photolthography set-up for electrode patterning.

Electron Beam Lithography(EBL) set-up with precise piezo motor stage.
E-Beam and Thermal Evaporator
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Electron Beam Evaporator under ~10-5Pa base pressure.

Thermal Evaporator for organic materials. By using liquid hellium, available to deposit under liquid He temperature.
More evaporators are avarable.
Other fabrication facility
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Van der Waals heterostructure factory with optical microscopy.

Rapid Thermal Annealer under Ar/H2 environment.

CVT set-up for oxidazation and crystal growth.

Bondhing machine.

UV ozone cleaner.

Home-built dry reactive ion etching machine.
Device Evaluation Facility
Probe station
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Variable temperature probe station. AC/DC transport measurement, optical measurement and high temperature measurement are available.

Variable temperature probe station ranging from 10K to 440K. AC/DC transport measurement is available.
Scanning probe microscopy
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Custormized AFM/EFM/MFM/SGM sysytem. Transport measurement and AFM lithography are also available.

AFM/EFM/SGM sysytem under vacuum.
Optics
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532nm green laser set-up and optical vortex set-up eqquiped with probe station.


Raman spectroscopy set-up equipped with optical microscope.
Low temperature measurement facility
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He cryostat with 9 tesla superconducting magnet.


He cryostat with 9 tesla superconducting magnet.

3He insert for 300mK measurement.

3He/4He dilution insert for 100mK measuremnt.

SPM system for ultra low temperature environment. AFM/SGM/EFM measurement is availbale.